Address:

Rm. 9-109, Tsinghua-Rohm Electronic Engineering Hall

Tsinghua University, Beijing 100084, China

Email: haox@mail.tsinghua.edu.cn

Education:

2020~2024 Ph.D. in Micro/Nanoelectronics, Universite de Lille, France

2015~2018 M.E. in Electronics Engineering, Xi’an Jiaotong University, China

2010~2014 B.S. in Optics, Harbin University of Science and Technology, China

Working Experience:

2024~Now Postdoc, Department of Electronic Engineering, Tsinghua University, China

2020~2024 Ph.D. Institute for Electronics, Microelectronics and Nanotechnology (IEMN), CNRS, France

2018~2020 Tsinghua-Berkeley Shenzhen Institute (TBSI), Tsinghua University, China

Professional Experience:

Hao Xu’s research focus is now on properties analysis of III-V semiconductor materials-based devices. During his PhD pursuit in CNRS-IEMN, he has carried out device properties analysis of silicon nitride materials-based membrane devices, called silicon nitride membrane nanoelectromechanical systems (NEMS). Critical fabrication processes for achieving such silicon nitride membrane NEMS have been proposed, including dry selective etching process to release silicon nitride membrane from its parental silicon substrate and the reflow process to fabricate a suspended aluminium air-bridge top-gate. Properties of silicon nitride membrane NEMS, such as megahertz resonance frequency and high-quality factor >10000, have been demonstrated experimentally. Utilizing this suspended aluminium top gate, parametric amplification or deamplification of input signals has been demonstrated as well. Additionally, silicon nitride membrane NEMS capable of detecting white noise heating has been validated, and it will be further exploited for fundamental thermometry use with temperature range down to mK.

Publications:

[1] Hao Xu, Srisaran Venkatachalam, Toky-Harrison Rabenimanana, Christophe Boyaval, Sophie Eliet, Flavie Braud, Eddy Collin, Didier Theron, Xin Zhou. “Imaging nanomechanical vibrations and manipulating parametric mode coupling via scanning microwave microscopy” Nano Letters 24 (28), 8550–8557 (2024)

[2] Hao Xu, Srisaran Venkatachalam, Christophe Boyaval, Pascal Tilmant, Francois Vaurette, Yves Deblock, Didier Theron, Xin Zhou. “Fabrication of silicon nitride membrane nanoelectromechanical resonator” Microelectronic Engineering 280, 112064 (2023)

[3] Hao Xu, Baofu Ding, Youan Xu, Ziyang Huang, Dahai Wei, Shaohua Chen, Tianshu Lan, Yikun Pan, Hui-Ming Cheng and Bilu Liu. “Magnetically tunable and stable deep-ultraviolet birefringent optics using two-dimensional hexagonal boron nitride” Nature Nanotechnology 17, 1091–1096 (2022)

[4] Alok Pokharel, Hao Xu, Srisaran Venkatachalam, Eddy Collin, Xin Zhou. “Capacitively coupled distinct mechanical resonators for room temperature phonon-cavity electromechanics” Nano Letters 22 (18), 7351-7357 (2022)

[5] Xin Zhou, Srisaran Venkatachalam, Ronghua Zhou, Hao Xu, Alok Pokharel, Andrew Fefferman, Mohammed Zaknoune, Eddy Collin. “High-Q silicon nitride drum resonators strongly coupled to gates” Nano Letters 21(13), 5738-5744 (2021)