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"Key fabrication process and application of micro-nano structure optoelectronic chip" passed scientific and technological achievement appraisal 

On the afternoon of July 15, 2022, the scientific and technological achievement appraisal meeting of "Key Fabrication Process and Application of Micro-nano Structure Optoelectronic Chip" was successfully held in Tongfang Science and Technology Square of Tsinghua University.  

The appraisal meeting is sponsored by Chinese Electronic Society, Academician Ninghua Zhu of Semiconductor Institute of Chinese Academy of Sciences holds the post of director of appraisal committee, Academician Shining Zhu from Nanjing University and Academician Wei Huang from Northwest Industrial University hold the post of deputy director of the committee.  Appraisal committee members include the Academician Yue Hao, Director of Information Division, NSFC, Academician Ru Huang, President of Southeast university, Academician Tiejun Cui from Southeast University, Academician Xiangang Luo from Institute of Photoelectric Technology, Chinese Academy of Sciences, Prof. Shanhong Xia from the Electronic Institute of Chinese Academy of Sciences, Prof. Xiangdong Zhang from Beijing institute of Technology,Prof. Xiaoyong Hu from Peking University, Prof. Fang Bo from Nankai University, and Prof. Xia Guo from Beijing University of Posts and Telecommunications.  

Rong Zeng, vice president of Tsinghua University attended the meeting and delivered a speech.  Academician Qionghai Dai, dean of the School of Information, Xianfei Meng, director of the Office of Scientific and technological Achievements, Yu Wang, Chairman of the Department of Electronic Engineering also attended the meeting.  

Professor Yidong Huang reported the achievements accumulated in the laboratory in the past twenty years.  Based on the physical mechanism of the photoelectric characteristics of micro-nano structures, we have made original breakthroughs in key fabrication processes of micro-nano photoelectronic structures for typical micro-nano photoelectronic effects such as photonic crystals, surface plasmons and photoacoustic microcavities, and successfully developed many kinds of world-leading optoelectronic chips.  It also provides customized micro-nano structure chip processing and process development for the cutting-edge research of more than 400 research teams and the development of new products of enterprises, and has established cross-material foundry platform for micro-nano optoelectronic chip.  

The appraisal committee listened carefully to the relevant reports, questioned and discussed the details of the results, and gave a high evaluation of the results.  It has reached the international leading level in the fabrication technology of deep-etching photonic crystals, nanoscale flatness metal films and super-large aspect ratio cantilever beam photoacoustic crystals.  It has effectively promoted the innovative research and industrial development in the field of new optoelectronic chips in China and produced significant economic and social benefits.  The project of "Key Fabrication Process and Application of micro-nano structure optoelectronic Chip" was approved by scientific and technological achievement appraisal. 

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2022年07月17日

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